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Official PYQ · 2003

GATE EC 2003 Set 1 Q44 — Electronic Devices

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If P\mathrm{P} is Passivation, Q\mathrm{Q} is nn-well implant, R\mathrm{R} is metallization and SS is source/drain diffusion, then the order in which they are carried out in a standard nn-well CMOS fabrication process, is

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Answer: B

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