Skip to content
Official PYQ · 2024

GATE EC 2024 Set 1 Q51 — Electronic Devices

Explain with AI
Consider a MOS capacitor made with p-type silicon. It has an oxide thickness of 100 nm100 \mathrm{~nm}, a fixed positive oxide charge of 10−8C/cm210^{-8} \mathrm{C} / \mathrm{cm}^{2} at the oxide-silicon interface, and a metal work function of 4.6eV4.6 \mathrm{eV}. Assume that the relative permittivity of the oxide is 4 and the absolute permittivity of free space is 8.85×10−14 F/cm8.85 \times 10^{-14} \mathrm{~F} / \mathrm{cm}. If the flatband voltage is 0 V0 \mathrm{~V}, the work function of the p-type silicon (in eV\mathrm{eV}, rounded off to two decimal places) is ______\_\_\_\_\_\_.
View answer

Answer: 4.10:4.50

Worked explanation not available yet.

Free practice · Your answers on this page are not saved.

Published
Report a correction
Keep exploringMore Electronic Devices questions