There are two photolithography systems: one with light source of wavelength λ1=156nm (System 1) and another with light source of wavelength λ2=325nm (System 2). Both photolithography systems are otherwise identical. If the minimum feature sizes that can be realized using system1 and system2 are Lmin1 and Lmin2 respectively, the ratio Lmin1/Lmin2 (correct to two decimal places) is __________.View answerShowHide
Answer: 0.47:0.51
Worked explanation not available yet.
Free practice · Your answers on this page are not saved.