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Official PYQ · 2018

GATE EC 2018 Set 1 Q20 — Electronic Devices

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There are two photolithography systems: one with light source of wavelength λ1=156 nm\lambda _{1}=156\:nm (System 11) and another with light source of wavelength λ2=325 nm\lambda _{2}=325\:nm (System 22). Both photolithography systems are otherwise identical. If the minimum feature sizes that can be realized using system11 and system22 are Lmin1L_{min1} and Lmin2L_{min2}  respectively, the ratio Lmin1/Lmin2L_{min1}/L_{min2} (correct to two decimal places) is __________.
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Answer: 0.47:0.51

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