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Official PYQ · 2014

GATE EC 2014 Set 3 Q36 — Electronic Devices

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An ideal MOS capacitor has boron doping-concentration of 1015cm−310^{15}cm^{-3} in the substrate. When a gate voltage is applied, a depletion region of width 0.50.5 μm\mu m is formed with a surface (channel) potential of 0.20.2 VV. Given that ε0=8.854×10−14F/cm\varepsilon _{0}= 8.854\times 10^{-14}F/cm and the relative permittivities of silicon and silicon dioxide are 1212 and 44, respectively, the peak electric field (in V/μmV/\mu m) in the oxide region is _______________.
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Answer: 2.3:2.5

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