An ideal MOS capacitor has boron doping-concentration of 1015cm−3 in the substrate. When a gate voltage is applied, a depletion region of width 0.5μm is formed with a surface (channel) potential of 0.2V. Given that ε0=8.854×10−14F/cm and the relative permittivities of silicon and silicon dioxide are 12 and 4, respectively, the peak electric field (in V/μm) in the oxide region is _______________.View answerShowHide
Answer: 2.3:2.5
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